ISSP2019: The 15th International Symposium on Sputtering & Plasma Processes

Topical Theme

Science-based Sputtering and Plasma Processes for the IoT Era

Schedule & Venue

June 11-14, 2019
Kanazawa Institute of Technology, Kanazawa, Japan

ISSP Special Tutorial, June 11
Prof.Dr. Diederik Depla (Ghent Univ., Belgium)
Fundamental aspects of reactive magnetron sputtering.
ISSP Regular Scientific Sessions, June 12-14

Important Schedules & Deadlines

Abstract Submission Open
October 20, 2018 (shceduled), with more detailed website.
Abstract Submission Deadline
January 15, 2019
Manuscripts for On-site Proceedings
April 19, 2019
Early bird registration (for 5,000 yen discount)
May 10, 2019

Subject Areas

  1. Fundamentals of Sputtering and Plasma Processes
  2. Sputtering Processes
  3. Plasma Processes
  4. Plasma Induced Process Technologies
  5. Thin Films
  6. Micro and Nano Technologies
  7. Applications
  8. Others

Past ISSP symposiums

Please visit ISSP archive to know more about the ISSP.


Contact to: ISSP Secretariat (issp@jvss.jp)